Xov Xwm - Chip MBE Project tau ua tiav xyoo dhau los

Technology

Molecular beam epitaxy, los yog MBE, yog cov txheej txheem tshiab rau kev loj hlob zoo zoo nyias zaj duab xis ntawm cov muaju ntawm cov siv lead ua substrates.Nyob rau hauv ultra-high lub tshuab nqus tsev, los ntawm lub qhov cub cua sov yog nruab nrog txhua yam ntawm cov khoom uas yuav tsum tau thiab ua kom muaj zog, los ntawm qhov tsim tom qab collimating beam atomic los yog molecular beam, ncaj qha txhaj mus rau qhov tsim nyog kub ntawm ib tug siv lead ua substrate, tswj molecular beam. lub substrate scanning tib lub sij hawm, nws muaj peev xwm ua rau cov molecules los yog atoms nyob rau hauv crystal alignment txheej los ua ib tug nyias zaj duab xis ntawm ib tug substrate "loj hlob".

Rau kev ua haujlwm ib txwm ntawm MBE cov cuab yeej, siab purity, tsis tshua muaj siab thiab ultra-ntxuav kua nitrogen yuav tsum tau ua kom tsis tu ncua thiab ruaj khov thauj mus rau chav txias ntawm cov khoom siv.Feem ntau, lub tank uas muab cov kua nitrogen muaj qhov tso zis siab ntawm 0.3MPa thiab 0.8MPa.Liquid nitrogen ntawm -196 ℃ yog yooj yim vaporized rau nitrogen thaum lub sij hawm thauj mus los.Thaum cov kua nitrogen nrog cov roj-kua piv ntawm li 1: 700 yog gasified nyob rau hauv lub raj xa dej, nws yuav nyob ib tug loj npaum li cas ntawm cov kua nitrogen txaus qhov chaw thiab txo qhov ib txwm ntws nyob rau hauv lub kawg ntawm cov kua nitrogen pipeline.Tsis tas li ntawd, nyob rau hauv cov kua nitrogen cia tank, yuav muaj cov khib nyiab uas tsis tau ntxuav.Nyob rau hauv cov kua nitrogen pipeline, lub hav zoov ntawm cov huab cua ntub kuj yuav ua rau cov tiam ntawm cov dej khov slag.Yog tias cov impurities no tawm mus rau hauv cov khoom siv, nws yuav ua rau cov khoom puas tsuaj tsis tuaj yeem.

Yog li ntawd, cov kua nitrogen nyob rau hauv lub tank cia sab nraum zoov yog thauj mus rau MBE cov khoom nyob rau hauv lub rhiav tsis muaj plua plav nrog high efficiency, stability thiab huv si, thiab tsis tshua muaj siab, tsis muaj nitrogen, tsis muaj impurities, 24 teev uninterrupted, xws li kev tswj kev thauj mus los. ib yam khoom tsim nyog.

Sib piv cov khoom siv MBE

Txij li xyoo 2005, HL Cryogenic Equipment (HL CRYO) tau ua kom zoo dua qub thiab txhim kho cov txheej txheem no thiab koom tes nrog cov tuam txhab MBE thoob ntiaj teb.MBE cov khoom lag luam, suav nrog DCA, REBER, muaj kev sib raug zoo nrog peb lub tuam txhab.MBE cov chaw tsim khoom, suav nrog DCA thiab REBER, tau koom tes hauv ntau qhov haujlwm.

Riber SA yog lub chaw muab kev pabcuam thoob ntiaj teb ntawm molecular beam epitaxy (MBE) cov khoom lag luam thiab cov kev pabcuam cuam tshuam rau kev tshawb fawb cov khoom siv semiconductor thiab cov ntawv thov kev lag luam.Riber MBE ntaus ntawv tuaj yeem tso cov txheej nyias nyias ntawm cov khoom siv rau ntawm lub substrate, nrog rau kev tswj siab heev.Cov khoom siv lub tshuab nqus tsev ntawm HL Cryogenic Equipment (HL CRYO) yog nruab nrog Riber SA Cov khoom siv loj tshaj plaws yog Riber 6000 thiab qhov tsawg tshaj plaws yog Compact 21. Nws yog qhov zoo thiab tau lees paub los ntawm cov neeg siv khoom.

DCA yog lub ntiaj teb ua oxide MBE.Txij li thaum xyoo 1993, kev txhim kho ntawm cov txheej txheem oxidation, antioxidant substrate cua sov thiab antioxidant qhov chaw tau ua tiav.Vim li no, ntau lub chaw soj nstuam tau xaiv DCA oxide tshuab.Composite semiconductor MBE tshuab tau siv thoob ntiaj teb.VJ kua nitrogen circulating system ntawm HL Cryogenic Equipment (HL CRYO) thiab MBE cov cuab yeej ntawm ntau cov qauv ntawm DCA muaj qhov sib txuam nrog ntau yam haujlwm, xws li tus qauv P600, R450, SGC800 thiab lwm yam.